7 July 1997 Phase-shift focus monitor applications to lithography tool control
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Abstract
Through the use of phase shift techniques, focus errors have been demonstrated to result in easily measurable overlay shifts in printed resist patterns. Using box-in-box with phase shifter design, patterns are printed on wafers and measured on standard overlay equipment. Results are compared to more conventional methods of focus detection. Details include measurement and calibration methodology, focus, and focus tilt results. Additionally, SPC in IBM's ASTC Fab is demonstrated with the Phase Shift Focus Monitor.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Donald C. Wheeler, Donald C. Wheeler, Eric P. Solecky, Eric P. Solecky, T. Dinh, T. Dinh, Rebecca D. Mih, Rebecca D. Mih, } "Phase-shift focus monitor applications to lithography tool control", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275968; https://doi.org/10.1117/12.275968
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