7 July 1997 Practical 3D lithography simulation system
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We have developed a 3D practical lithography simulation system and realized the practical parameter optimization. A very fast 3D profile computation is performed by using the FFT algorithm in aerial images and the post exposure bake. The optimization system is developed by using object- oriented technology in order to reduce the computation time. The resulted computational time is less than one tenth of the conventional system. The total parameter optimization time is also reduced.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hirotomo Inui, Hirotomo Inui, Hirokatsu Kaneko, Hirokatsu Kaneko, Keiichiro Tounai, Keiichiro Tounai, Kiroyoshi Tanabe, Kiroyoshi Tanabe, Toshiyuki Ohta, Toshiyuki Ohta, "Practical 3D lithography simulation system", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276031; https://doi.org/10.1117/12.276031

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