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7 July 1997 Real-time stage position measurement with nanometer-scale accuracy
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Abstract
Air turbulence affects the performance of the Helium-Neon interferometer used to control the wafer stage of stepper or step-and-scan lithography systems. In this paper, we describe characterization and reduction of the major error sources in an Air Turbulence Compensated Interferometer designed to address this problem.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Philip D. Henshaw, Donald P. DeGloria, Sandra A. Kelly, and Robert F. Dillon "Real-time stage position measurement with nanometer-scale accuracy", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276047
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