Proximity correction systems require an accurate, fast way to predict how a pattern configuration will transfer to the wafer. In this paper we present an efficient method for modeling the pattern transfer process based on Dennis Gabor's `theory of communication'. This method is based on a `convolution form' where any 2D transfer process can be modeled with a set of linear, 2D spatial filters, even when the transfer process is non-linear. We will show that this form is a general case from which other well-known process simulation models can be derived. Furthermore, we will demonstrate that the convolution form can be used to model observed phenomena, even when the physical mechanisms involved are unknown.