Toward a comprehensive control of full-field image quality in optical photolithography

Donis G. Flagello; Jos de Klerk; Guy Davies; Richard Rogoff; Bernd Geh; Michael Arnz; Ulrich Wegmann; Michael Kraemer

doi:10.1117/12.275987

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7 July 1997 Toward a comprehensive control of full-field image quality in optical photolithography

Donis G. Flagello; Jos de Klerk; Guy Davies; Richard Rogoff; Bernd Geh; Michael Arnz; Ulrich Wegmann; Michael Kraemer

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Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.275987
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

This paper shows, that as resolution is pushed into regions below 0.6 (lambda) /NA, understanding the effects of wavefront aberrations is crucial to producing stepper systems that can meet end-user requirements. We show how aberrations can affect the choice of optimum NA and partial coherence for a given reticle object when considering critical dimension uniformity and depth of focus. The ability to measure the complete wavefront and extract meaningful full-field aberration data is shown using an advanced through-the-lens interferometer that operates at the wavelength and bandwidth of the lithographic radiation. The impact of aberrations an image quality criteria is shown through a sensitivity analysis using an imaging approximation model that represents various image criteria as a weighted sum of aberration coefficients. The validity and use of such a model is shown by correlation to full- field experimental measurements.

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Donis G. Flagello, Jos de Klerk, Guy Davies, Richard Rogoff, Bernd Geh, Michael Arnz, Ulrich Wegmann, and Michael Kraemer "Toward a comprehensive control of full-field image quality in optical photolithography", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275987; https://doi.org/10.1117/12.275987

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