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7 July 1997 Toward a comprehensive control of full-field image quality in optical photolithography
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Abstract
This paper shows, that as resolution is pushed into regions below 0.6 (lambda) /NA, understanding the effects of wavefront aberrations is crucial to producing stepper systems that can meet end-user requirements. We show how aberrations can affect the choice of optimum NA and partial coherence for a given reticle object when considering critical dimension uniformity and depth of focus. The ability to measure the complete wavefront and extract meaningful full-field aberration data is shown using an advanced through-the-lens interferometer that operates at the wavelength and bandwidth of the lithographic radiation. The impact of aberrations an image quality criteria is shown through a sensitivity analysis using an imaging approximation model that represents various image criteria as a weighted sum of aberration coefficients. The validity and use of such a model is shown by correlation to full- field experimental measurements.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Donis G. Flagello, Jos de Klerk, Guy Davies, Richard Rogoff, Bernd Geh, Michael Arnz, Ulrich Wegmann, and Michael Kraemer "Toward a comprehensive control of full-field image quality in optical photolithography", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275987; https://doi.org/10.1117/12.275987
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