4 April 1997 Efficient VUV light sources from rare gas excimers and their applications
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Proceedings Volume 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1997) https://doi.org/10.1117/12.270264
Event: XI International Symposium on Gas Flow and Chemical Lasers and High Power Laser Conference, 1996, Edinburgh, United Kingdom
Abstract
Efficient VUV excimer lamps with two types of discharge configurations, expanding jet discharge and silent discharge (dielectric-barrier discharge) in a variety of rare gases and their mixtures, are presented. In the jet discharges VUV output power was 9 mW with an efficiency of 10-2% at 126 nm for argon excimers. Output powers of other excimers were 300 mW with 1.0% efficiency at 146 nm for krypton excimers and 500 mW with 1.6% efficiency at 176 nm for xenon excimers. Simultaneous emissions from hetero-nuclear rare gas excimers (ArKr*, 135 nm) as well as homo-nuclear rare gas excimers (Ar2* and Kr2*) were observed by using rare gas mixtures of argon and krypton. Output powers and efficiencies of the silent discharge excimer lamps were 500 mW and 1.6% for argon, 5 W and 13% for krypton, and 5 W and 20% for xenon excimers. In the silent discharge extremely broad band excimer emissions were observed at the center wavelengths of 145 nm for an argon/krypton mixture and of 163 nm for a krypton/xenon mixture. A PMMA plate was photo-chemically etched at the rates of 1 - 2 nm/min by the irradiation of the 172 nm radiation in air and argon gas atmospheres.
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Wataru Sasaki, Wataru Sasaki, Shoichi Kubodera, Shoichi Kubodera, Junji Kawanaka, Junji Kawanaka, } "Efficient VUV light sources from rare gas excimers and their applications", Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); doi: 10.1117/12.270264; https://doi.org/10.1117/12.270264
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