4 April 1997 Performance of 1-kHz KrF excimer laser for DUV lithography
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Proceedings Volume 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1997) https://doi.org/10.1117/12.270109
Event: XI International Symposium on Gas Flow and Chemical Lasers and High Power Laser Conference, 1996, Edinburgh, United Kingdom
Abstract
In response to the requirement for higher wafer throughput and increased dosage accuracy in DUV lithography steppers and scanners, Cymer has developed a 1 kHz KrF laser optimized for this application. We shall describe its performance and design features.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Palash P. Das, Palash P. Das, Richard G. Morton, Richard G. Morton, Igor V. Fomenkov, Igor V. Fomenkov, William N. Partlo, William N. Partlo, Richard L. Sandstrom, Richard L. Sandstrom, Cynthia A. Maley, Cynthia A. Maley, Ray Cybulski, Ray Cybulski, } "Performance of 1-kHz KrF excimer laser for DUV lithography", Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); doi: 10.1117/12.270109; https://doi.org/10.1117/12.270109
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