4 April 1997 UV-laser modifications and etching of thin polymer films in different environments
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Proceedings Volume 3093, Nonresonant Laser-Matter Interaction (NLMI-9); (1997) https://doi.org/10.1117/12.271664
Event: Nonresonant Laser-Matter Interaction, 1996, St. Petersburg, Russian Federation
Abstract
The role of environment in modification and etching of polymethylmethacrylate (PMMA) films by the fifth harmonic of Nd laser is investigated experimentally. The theoretical model is developed, which describes the main features of modification and etching kinetics for sufficiently small laser fluences.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nikita M. Bityurin, Sergey V. Muraviov, Alexander P. Alexandrov, N. G. Bronnikova, Aleksey Yu. Malyshev, "UV-laser modifications and etching of thin polymer films in different environments", Proc. SPIE 3093, Nonresonant Laser-Matter Interaction (NLMI-9), (4 April 1997); doi: 10.1117/12.271664; https://doi.org/10.1117/12.271664
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