1 April 1997 Ellipsometry for determining the refractive index profiles of thin films
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Proceedings Volume 3094, Polarimetry and Ellipsometry; (1997) https://doi.org/10.1117/12.271827
Event: Polarimetry and Ellipsometry, 1996, Kazimierz Dolny, Poland
Abstract
The results of using the inhomogeneous models as well as technique for their error determining are demonstrated. An inhomogeneous profile error was presented as set of 'error profiles'. The homogeneous, linear and exponential models of profiles of N and K were used for searching. Initial colloid SiO2 film, after its heating and exposition in air as well as after reactivating was studied. The layers with decreasing PbO component were found on surface of PbO-SiO2 glass. Graded N and K profiles of In2O3-SnO2 film, used as transparent conducting electrode, were determined by multiangle ellipsometry at wavelength of 632.8 nm.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladimir A. Tolmachev, "Ellipsometry for determining the refractive index profiles of thin films", Proc. SPIE 3094, Polarimetry and Ellipsometry, (1 April 1997); doi: 10.1117/12.271827; https://doi.org/10.1117/12.271827
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