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Hierarchical mask data design system (PROPHET) for aerial image simulation, automatic phase-shifter placement, and subpeak overlap checking
Application of image-processing software to characterize the photomask key parameters for future technologies
Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask
Image sensing method and defect detection algorithm for a 256-Mb and 1-Gb DRAM mask inspection system
Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks