28 July 1997 ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks
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Abstract
The exposure durability of chromium fluoride (CrF) was evaluated for phase shifter material in ArF excimer laser lithography. The film quality changes after 193 nm light irradiation were measured by using an optical spectroscope, an x-ray photoelectron spectroscopy (XPS), and an atomic force microscope (AFM). The film quality changes, such as decline of transmittance, surface oxidation, and roughness, were occurred in the sample irradiated in air, while little change were observed in nitrogen atmosphere.
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Yuko Seki, Jun Ushioda, Takashi Saito, Katsumi Maeda, Kaichiro Nakano, Shigeyuki Iwasa, Takeshi Ohfuji, Hiroshi Tanabe, "ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277260; https://doi.org/10.1117/12.277260
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