Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks

Kyoji Nakajo; Junya Sakemi; Akemi Moniwa; Tsuneo Terasawa; Norio Hasegawa; Eiji Tsujimoto

doi:10.1117/12.277292

28 July 1997 Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks

Kyoji Nakajo, Junya Sakemi, Akemi Moniwa, Tsuneo Terasawa, Norio Hasegawa, Eiji Tsujimoto

Proceedings Volume 3096, Photomask and X-Ray Mask Technology IV; (1997) https://doi.org/10.1117/12.277292
Event: Photomask Japan '97, 1997, Kawasaki City, Japan

Abstract

A fast automated method to detect sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks has been developed. This method approximates the sidelobe images by polygons, on which pattern operations are applied to quickly detect areas of overlap where unexpected images may occur. The feasibility of this method was demonstrated using hole patterns which contained 1.48 million pattern features. Calculation time was 4.3 hours, which was almost 3,500 times faster than aerial image simulation.

Citation Download Citation

Kyoji Nakajo, Junya Sakemi, Akemi Moniwa, Tsuneo Terasawa, Norio Hasegawa, and Eiji Tsujimoto "Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277292

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