28 July 1997 Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks
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Abstract
A fast automated method to detect sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks has been developed. This method approximates the sidelobe images by polygons, on which pattern operations are applied to quickly detect areas of overlap where unexpected images may occur. The feasibility of this method was demonstrated using hole patterns which contained 1.48 million pattern features. Calculation time was 4.3 hours, which was almost 3,500 times faster than aerial image simulation.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kyoji Nakajo, Kyoji Nakajo, Junya Sakemi, Junya Sakemi, Akemi Moniwa, Akemi Moniwa, Tsuneo Terasawa, Tsuneo Terasawa, Norio Hasegawa, Norio Hasegawa, Eiji Tsujimoto, Eiji Tsujimoto, } "Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277292; https://doi.org/10.1117/12.277292
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