Database inspection capability for the high-grade device

NamKyu Park; Hwa-Sup Bae; Jong-woon Chang; Seung-Woo Yoo

doi:10.1117/12.277288

28 July 1997 Database inspection capability for the high-grade device

NamKyu Park, Hwa-Sup Bae, Jong-woon Chang, Seung-Woo Yoo

Author Affiliations +

Proceedings Volume 3096, Photomask and X-Ray Mask Technology IV; (1997) https://doi.org/10.1117/12.277288
Event: Photomask Japan '97, 1997, Kawasaki City, Japan

Abstract

Recently, as the design rule of the device is rapidly tightened, defect control is more critical and high-end masks like 256 M and 1 G DRAM level have difficulty for database inspection due to high data volume, data density, OPC, etc. Therefore, it is necessary to evaluate the machine capability of database inspection and defect capture ability for critical layer. For the experiment, we prepared three test plates that have tight CD design and extreme small OPC patterns, and one of them is combined by 4 different layers as metal, contact, ipso, and poly and design rule is 1.0 - 1.5 micrometer. And we shrinked the some area (80, 75%) for confirming the limitation of DB inspection. Through this evaluation, we tried to identify current barriers such as CD uniformity problem, and overcome the barriers and find ways how to improve the inspection capability.

Citation Download Citation

NamKyu Park, Hwa-Sup Bae, Jong-woon Chang, and Seung-Woo Yoo "Database inspection capability for the high-grade device", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277288

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