28 July 1997 Development of an in-situ cleaning system for an e-beam reticle writer
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Abstract
We have newly designed and constructed a unique electron optical column installed with an in-situ cleaning system, applying the down-flow ashing process with a mixture O2 and CF4. We carried out in-situ cleaning using designed system, and confirmed that beam drift which is caused by charging up of a contamination layer was reduced.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kenji Ohtoshi, Kenji Ohtoshi, Satoshi Yamasaki, Satoshi Yamasaki, Shuichi Tamamushi, Shuichi Tamamushi, Toru Tojo, Toru Tojo, Ryoichi Hirano, Ryoichi Hirano, Yuuji Fukudome, Yuuji Fukudome, Naoharu Shimomura, Naoharu Shimomura, Shinsuke Nishimura, Shinsuke Nishimura, Shusuke Yoshitake, Shusuke Yoshitake, Munehiro Ogasawara, Munehiro Ogasawara, } "Development of an in-situ cleaning system for an e-beam reticle writer", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277287; https://doi.org/10.1117/12.277287
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