Paper
28 July 1997 Leaking light through embedded shifter-type opaque ring for attenuated phase-shift mask
Shoichi Hirooka, Shigeru Hasebe, Tomohiro Tsutsui, Shigeki Nojima, Hisako Aoyama, Hidehiro Watanabe
Author Affiliations +
Abstract
Critical dimension error on a wafer caused by leaking light through embedded shifter type opaque ring on an i-line attenuated phase-shift mask has been studied. We have produced the mask that includes small pinhole-array pattern as the opaque ring, and confirm that transmittance through the opaque ring depends on pinhole size in good agreement with coherent theory. Our experimental result shows that the leakage must be less than 0.125% in transmittance in order to control resist dimension error less than 0.01 micrometer on a wafer for 0.35 - 0.4 micrometer devices. We have also derived an analytical form to represent leaking light, which shows good fit to the transmittance measurements with the various pinhole size. Then we have estimated the allowable error in phase difference and transmittance of the shifter, and that in pinhole size, applying for this formula. We also discuss the process feasibility for embedded shifter type opaque ring.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shoichi Hirooka, Shigeru Hasebe, Tomohiro Tsutsui, Shigeki Nojima, Hisako Aoyama, and Hidehiro Watanabe "Leaking light through embedded shifter-type opaque ring for attenuated phase-shift mask", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277279
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Opacity

Photomasks

Semiconducting wafers

Transmittance

Chromium

Scanning electron microscopy

Critical dimension metrology

RELATED CONTENT

Mask defect specifications with fail-bit-map analysis
Proceedings of SPIE (December 27 2002)
Back to square 9 a demonstration of 9 in....
Proceedings of SPIE (December 27 2002)
Manufacturability of a 0.18-um OPC technology
Proceedings of SPIE (August 25 1999)
Characteristics of CD measurement equipment
Proceedings of SPIE (July 19 2000)

Back to Top