28 July 1997 New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs
Author Affiliations +
Abstract
For mask defect inspection in 256 Mbit and 1 Gbit DRAMs, it is necessary to have high sensitivity of 0.2 - 0.1 micrometer. A new die-to-database mask inspection system MC-2000 for 256 Mbit and 1 Gbit DRAMs has been developed. This system has high resolution optics with i-line light and high NA lens, and high speed and high accuracy data processing circuit by new multilevel bit map pattern generator, so the system has both high detectability and high throughput. This paper describes system configuration which include optical system and mechanical system, the defect inspection method, and inspection performance including defect sensitivity.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mitsuo Tabata, Mitsuo Tabata, Kyoji Yamashita, Kyoji Yamashita, Hideo Tsuchiya, Hideo Tsuchiya, Takehiko Nomura, Takehiko Nomura, Hiromu Inoue, Hiromu Inoue, Tomohide Watanabe, Tomohide Watanabe, Toru Tojo, Toru Tojo, Hisakazu Yoshino, Hisakazu Yoshino, } "New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277266; https://doi.org/10.1117/12.277266
PROCEEDINGS
8 PAGES


SHARE
Back to Top