18 August 1997 Prototype of an energy enhancer for mask-based laser material processing
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Proceedings Volume 3097, Lasers in Material Processing; (1997) https://doi.org/10.1117/12.281101
Event: Lasers and Optics in Manufacturing III, 1997, Munich, Germany
In general mask based laser material processing is a process which suffers from a low energy efficiency, because the majority of the laser light is absorbed in or reflected by the mask. We have developed a device called an energy enhancer which is capable of improving the energy efficiency by a factor of 2 - 4 for a typical TEA-CO2 system for mask based laser marking. A simple ray-tracing model has been built in order to design and optimize the energy enhancer. Thus we present experimental results as well as simulations and show fine accordance between the two. Important system parameters like component reflectivity and alignment sensitivity are investigated in order to evaluate the possibility of making commercial use of the device. The obtainable image quality and how this is influenced by the focusing and imaging system is discussed in some detail.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jens Bastue, Jens Bastue, Flemming O. Olsen, Flemming O. Olsen, } "Prototype of an energy enhancer for mask-based laser material processing", Proc. SPIE 3097, Lasers in Material Processing, (18 August 1997); doi: 10.1117/12.281101; https://doi.org/10.1117/12.281101

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