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24 September 1997 Characterization of chirped phase masks for UV applications by writing and investigation of fiber Bragg gratings
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Abstract
We describe the characterization of chirped phase masks made by electron beam writing and reactive ion etching in pure silica. The phase masks are designed to be used as diffractive optical elements in the process of manufacturing of fiber Bragg gratings (FBG). With the technologies available at our institutes grating structures with periods less than 200 nm can be realized in fused silica. Phase masks for writing ideally chirped FBG would require grating structures with continuously changing period. However because of the limited position accuracy of any e-beam writer, it is not possible to generate the desired continuous variation of the grating period. There appear discrete displacement steps with deviations of some nanometers. We obtain some information about the parameters of the phase mask from the properties of written fiber gratings. A sequence of short fiber gratings is written in order to characterize the phase mask. We use a slit to expose a definite small part of the phase mask pattern during the writing process of each short fiber grating. The center wavelength of each fiber grating is analyzed.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Manfred Rothhardt, Volker Hagemann, Ruediger Poehlmann, Siegmund Schroeter, and Hans-Joerg Fuchs "Characterization of chirped phase masks for UV applications by writing and investigation of fiber Bragg gratings", Proc. SPIE 3099, Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications, (24 September 1997); https://doi.org/10.1117/12.281230
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