11 July 1997 Studying Density vs Ar-pressures for optimization of DC-magnetron sputter deposition of Ni/C multilayers for hard x-ray telescopes
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Abstract
The influence of varying the Ar-pressure in the process of depositing Ni/C multilayers by dc-magnetron sputtering has been studied, and atomic force microscopy (AFM) measurements, x-ray characterization results and transmission electron microscopy (TEM) results are presented. Single Ni and C films and Ni/C multilayers were deposited at Ar-pressures of 1.5, 3, 5 and 7 mTorr. The one-dimensional power spectral density data from the AFM measurements clearly indicate that the best densities and thin film qualities for both materials are obtained at lower Ar-pressure, i.e. 1.5 mTorr.
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Ahsen M. Hussain, Suzanne E. Romaine, Paul Gorenstein, John E. Everett, Ricardo J. Bruni, Anna M. Clark, Michael F. Ruane, Y. Fedyunin, "Studying Density vs Ar-pressures for optimization of DC-magnetron sputter deposition of Ni/C multilayers for hard x-ray telescopes", Proc. SPIE 3113, Grazing Incidence and Multilayer X-Ray Optical Systems, (11 July 1997); doi: 10.1117/12.278855; https://doi.org/10.1117/12.278855
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