Unified thermal/elastic optical analysis of a lithographic lens

Alson E. Hatheway

doi:10.1117/12.284051

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25 September 1997 Unified thermal/elastic optical analysis of a lithographic lens

Alson E. Hatheway

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Proceedings Volume 3130, Lens Design, Illumination, and Optomechanical Modeling; (1997) https://doi.org/10.1117/12.284051
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

Lithographic lenses often exhibit shifts in focal position and magnification due to the influence of the heating transient initiated when the illuminator is turned on. Evaluation of these effects requires simultaneous solution of the equations of heat transfer, elasticity and optical images. "Unified” analysis techniques were used, including the Optical Analogtm, which provide accurate analysis of the influence of all the design variables on the optical image. This paper describes the modeling process in detail as well as the checkout techniques used to assure that the physics of the problem had been adequately captured in the model. The paper closes with a discussion of some of the valuable insights that were gained during the analysis.

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Alson E. Hatheway "Unified thermal/elastic optical analysis of a lithographic lens", Proc. SPIE 3130, Lens Design, Illumination, and Optomechanical Modeling, (25 September 1997); https://doi.org/10.1117/12.284051

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