Optical thin films using LPCVD and thermal reoxidation techniques

HanChieh Chao; Y. T. Wu; Wei-Chung Wang

doi:10.1117/12.290195

1 October 1997 Optical thin films using LPCVD and thermal reoxidation techniques

HanChieh Chao, Y. T. Wu, Wei-Chung Wang

Proceedings Volume 3133, Optical Thin Films V: New Developments; (1997) https://doi.org/10.1117/12.290195
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

A VLSI fabrication technique by using LPCVD to deposit polysilicon films and then reoxidized it back to specific oxide and polysilicon multilayer stacks has been studied and evaluated. Thermal oxide films are much more stable than PECVD oxide films both in optical and electrical response. Also, the NOX films has been examined and simulated for the related purpose.

Citation Download Citation

HanChieh Chao, Y. T. Wu, and Wei-Chung Wang "Optical thin films using LPCVD and thermal reoxidation techniques", Proc. SPIE 3133, Optical Thin Films V: New Developments, (1 October 1997); https://doi.org/10.1117/12.290195

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