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22 September 1997 Self-developing photopolymer system with ultraviolet sensitivity
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Abstract
Dichromated poly(acrylic acid) films with dimethyl formamide have been investigated as UV photosensitive recording medium for the fabrication of diffractive optical elements. Surface relief structures with large depth modulation have ben formed on these films. Relief depth of surface gratings as a function of exposure time and the spatial frequency of the gratings are presented. Atomic force microscopy 3D views of surface relief gratings are also presented.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Detlef Kip, Lutz Glabasnia, Rene M. Beaulieu, Roger A. Lessard, and Michel Bolte "Self-developing photopolymer system with ultraviolet sensitivity", Proc. SPIE 3135, Precision Plastic Optics for Optical Storage, Displays, Imaging, and Communications, (22 September 1997); https://doi.org/10.1117/12.279148
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