Formation of photosensitive alumina-based gel films and their application to fine patterning

Noboru Tohge; Gaoyang Zhao

doi:10.1117/12.284120

2 October 1997 Formation of photosensitive alumina-based gel films and their application to fine patterning

Noboru Tohge, Gaoyang Zhao

Proceedings Volume 3136, Sol-Gel Optics IV; (1997) https://doi.org/10.1117/12.284120
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

Photosensitivity of Al₂O₃ and Al₂O₃-SiO₂ gel films, which were derived from Al(O-sec-Bu)₃ modified with a variety of (beta) -diketones was studied. These gel films exhibited optical absorption bands in a UV-range, associated with the (pi) -(pi) * transition in the chelate rings of the (beta) -diketonato ligand. The irradiation of the gel films with UV-light corresponding to this transition decreased the solubility of these gel films in organic solvents or acidic aqueous solutions, accompanied with the dissociation of the chelate rings. Based on the change in solubility by the UV-irradiation, fine-patterns of Al₂O₃ and Al₂O₃-SiO₂ thin films, containing over 30 mol% Al₂O₃, were formed on various substrates. The incorporation of benzophenone in Al₂O₃ gel films was also found to improve their photosensitivity. Moreover, it was demonstrated that the present photosensitive gel films were applicable to the fabrication of diffraction gratings using excimer laser and a phase mask.

Citation Download Citation

Noboru Tohge and Gaoyang Zhao "Formation of photosensitive alumina-based gel films and their application to fine patterning", Proc. SPIE 3136, Sol-Gel Optics IV, (2 October 1997); https://doi.org/10.1117/12.284120

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