Near-field modeling versus optical ray modeling of extended halogen light source in computer design of a reflector

Peter V. Shmelev; Brij M. Khorana

doi:10.1117/12.279225

26 September 1997 Near-field modeling versus optical ray modeling of extended halogen light source in computer design of a reflector

Peter V. Shmelev, Brij M. Khorana

Author Affiliations +

Proceedings Volume 3140, Photometric Engineering of Sources and Systems; (1997) https://doi.org/10.1117/12.279225
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

A near-field modeling technique was applied to modeling of a halogen extended light source. The modeling was performed to create a continuous set of rays which can then be used in raytracing for the purpose of designing a reflector. The near- field modeling was implemented by acquiring a series of images of the source using CCD camera with wide-angle lens focused at infinity. Optical ray model, which involved geometrical and ray modeling of the source to match its measured luminous intensity distribution, was also developed. Luminous intensity distribution as well as illuminance pattern from a reflector/source combination, calculated using near-field and optical ray models, were compared. It is demonstrated, in this paper, that near-field modeling technique has several advantages over the optical ray modeling technique when used for computer design of reflectors.

Citation Download Citation

Peter V. Shmelev and Brij M. Khorana "Near-field modeling versus optical ray modeling of extended halogen light source in computer design of a reflector", Proc. SPIE 3140, Photometric Engineering of Sources and Systems, (26 September 1997); https://doi.org/10.1117/12.279225

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