1 December 1997 Effect of TPD:CuPc LB films as electron blocking layer on EL emission
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In organic thin film electroluminescence device with ITO/PPV/TPD:CuPc/Alq:DCMl/Al structure, the TPD:CuPc Langmuir-Blodgett (LB) film as electron-blocking layer was inserted between PPV and Alq:DCMl layer. A device without TPD:CuPc layer or a device with monolayer of TPD:CuPc which was applied at higher DC voltage exhibited EL emission from both the PPV and Alq:DCMl layers. Whereas a device with monolayer of TPD:CuPc layer which was applied at lower voltage or a device with double layers of TPD:CuPc had an EL emission only from Alq:DCMl layer implying that the TPD:CuPc layer can effectively block the electrons and the Alq:DCMl electron transport layer worked as the emitting layer. Hence, we can spatially control the recombination zone and obtain different EL emission by adjusting the thickness of carrier blocking layer.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yulin Hua, Xiaohui Yang, Yanbing Hou, Junbiao Peng, Xiulan Feng, "Effect of TPD:CuPc LB films as electron blocking layer on EL emission", Proc. SPIE 3148, Organic Light-Emitting Materials and Devices, (1 December 1997); doi: 10.1117/12.279334; https://doi.org/10.1117/12.279334

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