Graded-Layer-Thickness Bragg X-Ray Reflectors

D. J. Nagel; T. W. Barbee, Jr.; J. V. Gilfrich

doi:10.1117/12.932996

3 May 1982 Graded-Layer-Thickness Bragg X-Ray Reflectors

D. J. Nagel, T. W. Barbee, Jr., J. V. Gilfrich

Proceedings Volume 0315, Reflecting Optics for Synchrotron Radiation; (1982) https://doi.org/10.1117/12.932996
Event: 1981 Brookhaven Conferences, 1981, Upton, United States

Abstract

Multilayer x-ray reflectors which have layers that vary in thickness, either in depth or laterally along the surface, were prepared by sputtering. Alternating layers of W and C were deposited on flexible mica and smooth silicon-wafer substrates. X-ray diffraction properties of the multilayers were measured in the 1.54-8.34 A region. The mutlilayer on mica represents a dual-spacing depth-graded device. Diffraction from both the multilayer and mica was observed. A smoothly-depth-graded multilayer on silicon has a relatively-wide rocking curve which agrees well with diffraction theory. A laterally-graded multilayer on silicon has a bilayer thickness (d value) which varies linearly from 24.8 to 29.2 A in 6 cm.

Citation Download Citation

D. J. Nagel, T. W. Barbee, Jr., and J. V. Gilfrich "Graded-Layer-Thickness Bragg X-Ray Reflectors", Proc. SPIE 0315, Reflecting Optics for Synchrotron Radiation, (3 May 1982); https://doi.org/10.1117/12.932996

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