PROCEEDINGS VOLUME 3150
OPTICAL SCIENCE, ENGINEERING AND INSTRUMENTATION '97 | 27 JULY - 1 AUGUST 1997
Gratings and Grating Monochromators for Synchrotron Radiation
IN THIS VOLUME

3 Sessions, 22 Papers, 0 Presentations
OPTICAL SCIENCE, ENGINEERING AND INSTRUMENTATION '97
27 July - 1 August 1997
San Diego, CA, United States
Diffraction Gratings and Grating Efficiency
Proc. SPIE 3150, X-ray multilayer gratings with very high diffraction efficiency, 0000 (3 November 1997); doi: 10.1117/12.292728
Proc. SPIE 3150, Experimental determination of the diffraction efficiency and high-order suppression of gratings for synchrotron radiation, 0000 (3 November 1997); doi: 10.1117/12.279368
Proc. SPIE 3150, Multilayer-coated soft x-ray diffraction gratings for synchrotron radiation applications, 0000 (3 November 1997); doi: 10.1117/12.283980
Proc. SPIE 3150, Application of hybrid design method to VUV double-element optical systems equipped with holographic gratings recorded with aspheric wavefronts, 0000 (3 November 1997); doi: 10.1117/12.283981
Proc. SPIE 3150, Experimental comparison of mechanically ruled and holographically recorded plane varied-line-spacing gratings, 0000 (3 November 1997); doi: 10.1117/12.292734
Optical and Optomechanical Design of Monochromator Systems
Proc. SPIE 3150, SM-PGM monochromator design for large spectral range, 0000 (3 November 1997); doi: 10.1117/12.283982
Proc. SPIE 3150, Performance of a varied-space plane-grating monochromator, 0000 (3 November 1997); doi: 10.1117/12.283983
Proc. SPIE 3150, Monochromator for materials science beamline at Elettra, 0000 (3 November 1997); doi: 10.1117/12.279365
Proc. SPIE 3150, System for controlling the variable-angle spherical-grating monochromators at Elettra, 0000 (3 November 1997); doi: 10.1117/12.279366
Poster Session
Proc. SPIE 3150, Necessity of precise in-house adjustment for synchrotron radiation monochromator, 0000 (3 November 1997); doi: 10.1117/12.292729
Optical and Optomechanical Design of Monochromator Systems
Proc. SPIE 3150, Derivation of aberration coefficients for single-element plane-symmetric reflecting systems using Mathematica, 0000 (3 November 1997); doi: 10.1117/12.292730
Proc. SPIE 3150, Aberration analysis calculations for synchrotron radiation beamline design, 0000 (3 November 1997); doi: 10.1117/12.292731
Poster Session
Proc. SPIE 3150, Laminar versus trapezoidal grating profiles: AFM measurements and efficiency simulations, 0000 (3 November 1997); doi: 10.1117/12.279367
Proc. SPIE 3150, Comparison of blazed and laminar profile varied-line-spacing gratings, 0000 (3 November 1997); doi: 10.1117/12.283975
Proc. SPIE 3150, Design and efficiency characterization of diffraction gratings for applications in synchrotron monochromators by electromagnetic methods and its comparison with measurement, 0000 (3 November 1997); doi: 10.1117/12.283976
Proc. SPIE 3150, Optimization of a spectromicroscopy beamline at BESSY II, 0000 (3 November 1997); doi: 10.1117/12.283977
Proc. SPIE 3150, Wavefront propagation in synchrotron radiation beamlines, 0000 (3 November 1997); doi: 10.1117/12.279369
Proc. SPIE 3150, Fabrication of a varied-line-spacing plane grating with aspheric wavefront holographic recording for a new grazing incidence monochromator at the Photon Factory, 0000 (3 November 1997); doi: 10.1117/12.279370
Proc. SPIE 3150, Virtual sine arm kinematic mount system, 0000 (3 November 1997); doi: 10.1117/12.283978
Proc. SPIE 3150, Soft x-ray spectroscopy undulator beamline at the Advanced Photon Source, 0000 (3 November 1997); doi: 10.1117/12.292732
Proc. SPIE 3150, Multilayer spherical grating monochromator for 1- to 4-KeV x rays, 0000 (3 November 1997); doi: 10.1117/12.292733
Optical and Optomechanical Design of Monochromator Systems
Proc. SPIE 3150, First results from the new optical configuration for a synchrotron radiation monochromator applied to the ALOISA beamline, 0000 (3 November 1997); doi: 10.1117/12.283979
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