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11 December 1997 Spherical bent focusing analyzer for high-resolution inelastic x-ray scattering
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Abstract
A new technique for making a high resolution X-ray analyzer is presented. The analyzer consists of a silicon wafer with <111> orientation, a Pyrex glass wafer and a concave polished Pyrex glass substrate. The energy resolution of the analyzer was studied on the inelastic scattering beamline of the Synchrotron Radiation Instrumentation Collaborative Access Team on sector 3 of the APS using the Si(777) back reflection at 13.84 keV. Details are presented and compared with other techniques, and we discuss contributions of the measured energy resolution.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Markus Schwoerer-Boehning, Peter M. Abbamonte, Albert T. Macrander, and Vladimir I. Kushnir "Spherical bent focusing analyzer for high-resolution inelastic x-ray scattering", Proc. SPIE 3151, High Heat Flux and Synchrotron Radiation Beamlines, (11 December 1997); https://doi.org/10.1117/12.294487
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