Spherical bent focusing analyzer for high-resolution inelastic x-ray scattering

Markus Schwoerer-Boehning; Peter M. Abbamonte; Albert T. Macrander; Vladimir I. Kushnir

doi:10.1117/12.294487

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11 December 1997 Spherical bent focusing analyzer for high-resolution inelastic x-ray scattering

Markus Schwoerer-Boehning, Peter M. Abbamonte, Albert T. Macrander, Vladimir I. Kushnir

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Proceedings Volume 3151, High Heat Flux and Synchrotron Radiation Beamlines; (1997) https://doi.org/10.1117/12.294487
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

A new technique for making a high resolution X-ray analyzer is presented. The analyzer consists of a silicon wafer with <111> orientation, a Pyrex glass wafer and a concave polished Pyrex glass substrate. The energy resolution of the analyzer was studied on the inelastic scattering beamline of the Synchrotron Radiation Instrumentation Collaborative Access Team on sector 3 of the APS using the Si(777) back reflection at 13.84 keV. Details are presented and compared with other techniques, and we discuss contributions of the measured energy resolution.

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Markus Schwoerer-Boehning, Peter M. Abbamonte, Albert T. Macrander, and Vladimir I. Kushnir "Spherical bent focusing analyzer for high-resolution inelastic x-ray scattering", Proc. SPIE 3151, High Heat Flux and Synchrotron Radiation Beamlines, (11 December 1997); https://doi.org/10.1117/12.294487

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