Yuriy Ya. Platonov,1 David M. Broadway,1 Brian DeGroot,1 Boris Verman,1 Bonglea Kim,1 George Gutman,1 James L. Wood,1 James Rodriguez,1 Nicola Grupido1
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W-B4C multilayers with single d-spacing period of 2.2 nm have been deposited on 330 long by 50 mm wide Si substrates to be used as monochromators for a computed tomography application. Using magnetron sputtering and a substrate masking technique, d-spacing uniformities of +/- 0.86% and +/- 1% were obtained over a 180 mm by 100 mm area for 2.2 nm and 4.2 nm d-spacings respectively. Two separate processes were used to coat the 330 mm long substrate, wherein half of the substrate was coated in each process. A similar process was used to deposit depth graded W-B4C supermirrors on Si and CVD SiC substrates for a beamline pre-mirror application. The 330 mm long by 50 mm wide Si and 300 mm long by 79 mm wide SiC substrates were coated with 20 bi-layer supermirrors with d-spacings ranging from 4.4 nm to 10.8 nm. For an angiography research application laterally graded W-B4C multilayers were deposited on 150 mm by 120 mm silicon substrates. A strong nonlinear d-spacing gradient, from 1.6 nm to 3.8 nm was achieved across the mirror's surface in an attempt to provide uniform intensity over the reflected area. The maximum and minimum d-spacing gradient was 0.06 nm/mm and 0.003 nm/mm, respectively. We measured and mapped the d-spacing gradient using a custom Cu-Ka diffraction system. The measured d-spacings were within +/- 1.5% of the intended d-spacings.
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Yuriy Ya. Platonov, David M. Broadway, Brian DeGroot, Boris Verman, Bonglea Kim, George Gutman, James L. Wood, James Rodriguez, Nicola Grupido, "Deposition of x-ray multilayers on long-size substrates for synchrotron applications," Proc. SPIE 3152, Materials, Manufacturing, and Measurement for Synchrotron Radiation Mirrors, (1 November 1997); https://doi.org/10.1117/12.295561