1 November 1997 Deposition of x-ray multilayers on long-size substrates for synchrotron applications
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Abstract
W-B4C multilayers with single d-spacing period of 2.2 nm have been deposited on 330 long by 50 mm wide Si substrates to be used as monochromators for a computed tomography application. Using magnetron sputtering and a substrate masking technique, d-spacing uniformities of +/- 0.86% and +/- 1% were obtained over a 180 mm by 100 mm area for 2.2 nm and 4.2 nm d-spacings respectively. Two separate processes were used to coat the 330 mm long substrate, wherein half of the substrate was coated in each process. A similar process was used to deposit depth graded W-B4C supermirrors on Si and CVD SiC substrates for a beamline pre-mirror application. The 330 mm long by 50 mm wide Si and 300 mm long by 79 mm wide SiC substrates were coated with 20 bi-layer supermirrors with d-spacings ranging from 4.4 nm to 10.8 nm. For an angiography research application laterally graded W-B4C multilayers were deposited on 150 mm by 120 mm silicon substrates. A strong nonlinear d-spacing gradient, from 1.6 nm to 3.8 nm was achieved across the mirror's surface in an attempt to provide uniform intensity over the reflected area. The maximum and minimum d-spacing gradient was 0.06 nm/mm and 0.003 nm/mm, respectively. We measured and mapped the d-spacing gradient using a custom Cu-Ka diffraction system. The measured d-spacings were within +/- 1.5% of the intended d-spacings.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuriy Ya. Platonov, David M. Broadway, Brian DeGroot, Boris Verman, Bonglea Kim, George Gutman, James L. Wood, James Rodriguez, Nicola Grupido, "Deposition of x-ray multilayers on long-size substrates for synchrotron applications", Proc. SPIE 3152, Materials, Manufacturing, and Measurement for Synchrotron Radiation Mirrors, (1 November 1997); doi: 10.1117/12.295561; https://doi.org/10.1117/12.295561
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