Paper
1 November 1997 Deposition of x-ray multilayers on long-size substrates for synchrotron applications
Yuriy Ya. Platonov, David M. Broadway, Brian DeGroot, Boris Verman, Bonglea Kim, George Gutman, James L. Wood, James Rodriguez, Nicola Grupido
Author Affiliations +
Abstract
W-B4C multilayers with single d-spacing period of 2.2 nm have been deposited on 330 long by 50 mm wide Si substrates to be used as monochromators for a computed tomography application. Using magnetron sputtering and a substrate masking technique, d-spacing uniformities of +/- 0.86% and +/- 1% were obtained over a 180 mm by 100 mm area for 2.2 nm and 4.2 nm d-spacings respectively. Two separate processes were used to coat the 330 mm long substrate, wherein half of the substrate was coated in each process. A similar process was used to deposit depth graded W-B4C supermirrors on Si and CVD SiC substrates for a beamline pre-mirror application. The 330 mm long by 50 mm wide Si and 300 mm long by 79 mm wide SiC substrates were coated with 20 bi-layer supermirrors with d-spacings ranging from 4.4 nm to 10.8 nm. For an angiography research application laterally graded W-B4C multilayers were deposited on 150 mm by 120 mm silicon substrates. A strong nonlinear d-spacing gradient, from 1.6 nm to 3.8 nm was achieved across the mirror's surface in an attempt to provide uniform intensity over the reflected area. The maximum and minimum d-spacing gradient was 0.06 nm/mm and 0.003 nm/mm, respectively. We measured and mapped the d-spacing gradient using a custom Cu-Ka diffraction system. The measured d-spacings were within +/- 1.5% of the intended d-spacings.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuriy Ya. Platonov, David M. Broadway, Brian DeGroot, Boris Verman, Bonglea Kim, George Gutman, James L. Wood, James Rodriguez, and Nicola Grupido "Deposition of x-ray multilayers on long-size substrates for synchrotron applications", Proc. SPIE 3152, Materials, Manufacturing, and Measurement for Synchrotron Radiation Mirrors, (1 November 1997); https://doi.org/10.1117/12.295561
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Multilayers

Mirrors

Reflectivity

Coating

Silicon

X-rays

Silicon carbide

RELATED CONTENT

W/C multilayers deposited on plastic films
Proceedings of SPIE (January 21 1993)
Graded multilayers for focusing hard x-rays below 50 nm
Proceedings of SPIE (August 29 2006)
Performance of multilayer coated silicon pore optics
Proceedings of SPIE (July 29 2010)
Recent Results In Multilayer Research
Proceedings of SPIE (December 16 1988)

Back to Top