PROCEEDINGS VOLUME 3155
OPTICAL SCIENCE, ENGINEERING AND INSTRUMENTATION '97 | 27 JULY - 1 AUGUST 1997
Charged Particle Optics III
Editor(s): Eric Munro
OPTICAL SCIENCE, ENGINEERING AND INSTRUMENTATION '97
27 July - 1 August 1997
San Diego, CA, United States
Electron Guns and Space Charge
Proc. SPIE 3155, Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL), 0000 (25 September 1997); doi: 10.1117/12.287808
Proc. SPIE 3155, Emission models for thermionic cathodes, 0000 (25 September 1997); doi: 10.1117/12.279397
Electron Lenses and Deflectors: Analysis and Design
Proc. SPIE 3155, Design of a magnification and rotation unit with predesign tool POCAD, 0000 (25 September 1997); doi: 10.1117/12.287817
Proc. SPIE 3155, In-lens deflectors for an LVSEM magnetic immersion objective lens, 0000 (25 September 1997); doi: 10.1117/12.279403
Proc. SPIE 3155, Analysis of off-axis-shaped beam systems for high-throughput electron-beam lithography, 0000 (25 September 1997); doi: 10.1117/12.287818
Proc. SPIE 3155, Simulation of microstrip deflectors for field emission display, 0000 (25 September 1997); doi: 10.1117/12.279404
Numerical Simulation and Design Techniques
Proc. SPIE 3155, Mesh refinement for finite-element field computations in electron optics, 0000 (25 September 1997); doi: 10.1117/12.279391
Proc. SPIE 3155, Improved 3D boundary charge method for high-accuracy electric field calculation, 0000 (25 September 1997); doi: 10.1117/12.279392
Proc. SPIE 3155, Matrizant method for an optimal synthesis of nonlinear magnetic and electrostatic focusing systems for a given beam current, 0000 (25 September 1997); doi: 10.1117/12.287809
Electron and Ion Lithography, E-Beam Testing, and Electron Microscopes
Proc. SPIE 3155, Compact electrostatic lithography column for nanoscale exposure, 0000 (25 September 1997); doi: 10.1117/12.287810
Proc. SPIE 3155, Novel resist and exposure strategy for high-resolution electron-beam lithography, 0000 (25 September 1997); doi: 10.1117/12.279393
Proc. SPIE 3155, Testing printed circuit boards and MCMs with electron beams, 0000 (25 September 1997); doi: 10.1117/12.279394
Proc. SPIE 3155, Miniature scanning electron microscope design based upon the use of permanent magnets, 0000 (25 September 1997); doi: 10.1117/12.279395
Accelerators, Curved Axis Systems, and Multipole Lenses
Proc. SPIE 3155, Arbitrary order maps, remainder terms, and long-term stability in particle accelerators, 0000 (25 September 1997); doi: 10.1117/12.279396
Proc. SPIE 3155, Computer analysis of imaging energy filters, 0000 (25 September 1997); doi: 10.1117/12.287811
Proc. SPIE 3155, Influence of the rod diameter of electrostatic quadrupole lenses on the axial field and on the minimum spot size in nonlinear microprobes, 0000 (25 September 1997); doi: 10.1117/12.287812
Aberration Analysis and Correction
Proc. SPIE 3155, Spherical aberration correction of a focused ion beam with space charge, 0000 (25 September 1997); doi: 10.1117/12.279398
Proc. SPIE 3155, Arbitrary order aberrations for elements characterized by measured fields, 0000 (25 September 1997); doi: 10.1117/12.287813
Proc. SPIE 3155, Influence of perturbations at distortion and tolerances with regard for their corrections in ion-projection systems, 0000 (25 September 1997); doi: 10.1117/12.279399
Proc. SPIE 3155, Some models and codes in imaging and high-current electron optics, 0000 (25 September 1997); doi: 10.1117/12.279400
Numerical Simulation and Design Techniques
Proc. SPIE 3155, Discretization of partial differential equations in irregular meshes, 0000 (25 September 1997); doi: 10.1117/12.279401
Electron Lenses and Deflectors: Analysis and Design
Proc. SPIE 3155, Optimization of electrostatic lens systems: fast approximate calculation of the imaging properites of einzel lenses, 0000 (25 September 1997); doi: 10.1117/12.287814
Proc. SPIE 3155, Nature of distortions of the surface pattern produced by precise electron-beam processing of insulators, 0000 (25 September 1997); doi: 10.1117/12.287815
Proc. SPIE 3155, Electrostatic deflection aberrations studied with ray tracing: a surprising and simple solution proposed, 0000 (25 September 1997); doi: 10.1117/12.279402
Aberration Analysis and Correction
Proc. SPIE 3155, Modern numerical techniques and software for photo- and thermoemission electron optical systems computer-aided design, 0000 (25 September 1997); doi: 10.1117/12.287816
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