25 September 1997 Compact electrostatic lithography column for nanoscale exposure
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Abstract
This paper describes an all-electrostatic electron-beam column which uses conventional electrode assemblies, resulting in a system which is very much smaller than a magnetic lens column. Computer modeling of the electron-optical performance of the column has shown that the concept has promise as a lithography tool. Beam broadening due to electron-electron interactions and aberrations of the final accelerating lens are both small enough to give a resolution which matches that of present-day magnetic columns.
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Tom Chisholm, Tom Chisholm, Haoning Liu, Haoning Liu, Eric Munro, Eric Munro, John A. Rouse, John A. Rouse, Xieqing Zhu, Xieqing Zhu, } "Compact electrostatic lithography column for nanoscale exposure", Proc. SPIE 3155, Charged Particle Optics III, (25 September 1997); doi: 10.1117/12.287810; https://doi.org/10.1117/12.287810
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