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25 September 1997 Compact electrostatic lithography column for nanoscale exposure
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This paper describes an all-electrostatic electron-beam column which uses conventional electrode assemblies, resulting in a system which is very much smaller than a magnetic lens column. Computer modeling of the electron-optical performance of the column has shown that the concept has promise as a lithography tool. Beam broadening due to electron-electron interactions and aberrations of the final accelerating lens are both small enough to give a resolution which matches that of present-day magnetic columns.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tom Chisholm, Haoning Liu, Eric Munro, John A. Rouse, and Xieqing Zhu "Compact electrostatic lithography column for nanoscale exposure", Proc. SPIE 3155, Charged Particle Optics III, (25 September 1997);

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