Influence of perturbations at distortion and tolerances with regard for their corrections in ion-projection systems

Stanislav N. Jatchmenev; Alexander A. Chinenov

doi:10.1117/12.279399

25 September 1997 Influence of perturbations at distortion and tolerances with regard for their corrections in ion-projection systems

Stanislav N. Jatchmenev, Alexander A. Chinenov

Author Affiliations +

Proceedings Volume 3155, Charged Particle Optics III; (1997) https://doi.org/10.1117/12.279399
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

Jon Projection Lithography is depended on successful realization of system project. Very critical parameter of optical image limiting permissible work field is a distortion. A peculiarity of distortion is in exceptional significance of a fiveorder aberration in optimum state oftuning, when there is a circumference of zero-distortion. This state very sensitive to any perturbations. It has worked out a conception of design taking account the main possible sources of perturbation and means of its restrictions. This means includes above all a correction by multipoles and next now the tolerances considering a presence of multipoles. Important role in the process is assigned to an ifiumination part of optical system. Keywords: Ion Projection, Distortion, Tolerances, Integral equations.

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Stanislav N. Jatchmenev and Alexander A. Chinenov "Influence of perturbations at distortion and tolerances with regard for their corrections in ion-projection systems", Proc. SPIE 3155, Charged Particle Optics III, (25 September 1997); https://doi.org/10.1117/12.279399

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