14 October 1997 Extreme ultraviolet spectroscopy of a laser plasma source for lithography
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Abstract
Spectra from various target materials from a KrF-laser plasma source have been investigated in the extreme UV spectral range between 12 and 17 nm using an off-Rowland grazing-incidence spectrograph. Additional calibration of the yield at 13 nm and measurement of the spatial and temporal characteristics of the plasma has been done using a combination of a multilayer mirror and XUV diode or fiber image carrier system.
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Fred Bijkerk, Fred Bijkerk, Alexander P. Shevelko, Alexander P. Shevelko, Leonid A. Shmaenok, Leonid A. Shmaenok, S. S. Churilov, S. S. Churilov, } "Extreme ultraviolet spectroscopy of a laser plasma source for lithography", Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); doi: 10.1117/12.283984; https://doi.org/10.1117/12.283984
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