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24 March 1982 X-Ray And Extreme Ultraviolet Imaging Using Layered Synthetic Microstructures
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Proceedings Volume 0316, High Resolution Soft X-Ray Optics; (1982) https://doi.org/10.1117/12.933135
Event: 1981 Brookhaven Conferences, 1981, Upton, United States
Abstract
Techniques have recently been developed for the fabrication, by sputtering, of multi-layer structures in which the individual layers may have thicknesses as little as a few atomic diameters. Diffraction experiments with x-rays of wavelength ranging from less than 1 Å to 113 Å have shown these layered synthetic microstructures to have a high degree of perfection. They act as efficient reflectors for x-rays and EUV radiation at angles of incidence from 0o to almost 90o (extreme glancing incidence). Experimental results using normal incidence imaging optics at soft x-ray wavelengths are shown. Such optics can be used in a variety of configurations for both solar and non-solar x-ray astronomy. The advantages of two particular systems - the single mirror and the hybrid Wolter-LSM system - are discussed and performance calculations presented.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James H. Underwood, Troy W. Barbee, and David L. Shealy "X-Ray And Extreme Ultraviolet Imaging Using Layered Synthetic Microstructures", Proc. SPIE 0316, High Resolution Soft X-Ray Optics, (24 March 1982); https://doi.org/10.1117/12.933135
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