Optical Damage Resistance Of Lithium Niobate Waveguides

R. L. Holman; P. J. Cressman

doi:10.1117/12.933083

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2 August 1982 Optical Damage Resistance Of Lithium Niobate Waveguides

R. L. Holman, P. J. Cressman

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Proceedings Volume 0317, Integrated Optics and Millimeter and Microwave Integrated Circuits; (1982) https://doi.org/10.1117/12.933083
Event: Integrated Optics and Millimeter and Microwave Integrated Circuits, 1981, Huntsville, United States

Abstract

The optical damage resistance of diffused lithium niobate waveguides is reviewed. Long-term laser-power-handling performance is assessed by recording the spatial intensity changes occurring as a function of time in a waveguide's far-field. Out-diffused waveguides are found to offer significantly greater long-term resistance to optical power-losses caused by optical damage than do wavegudies formed by either ion-exchange or titanium-in-diffusion. Any waveguide's resistance to optical damage is lowered by inadvertant exposure to chemical reducing conditions that can prevail during device fabrication processes. Waveguides exposed to the severe chemical reducing conditions are found to exhibit dramatically non-linear behavior when exposed to high laser powers and short laser wavelengths.

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R. L. Holman and P. J. Cressman "Optical Damage Resistance Of Lithium Niobate Waveguides", Proc. SPIE 0317, Integrated Optics and Millimeter and Microwave Integrated Circuits, (2 August 1982); https://doi.org/10.1117/12.933083

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