PL study of QDs manufactured by visible light lithography and wet etching

Xingquan Liu; Mingfang Wan; Bo Zhang; Xiaoshuang Chen; Wei Lu; Shuechu Shen

doi:10.1117/12.300716

20 February 1998 PL study of QDs manufactured by visible light lithography and wet etching

Xingquan Liu, Mingfang Wan, Bo Zhang, Xiaoshuang Chen, Wei Lu, Shuechu Shen

Proceedings Volume 3175, Third International Conference on Thin Film Physics and Applications; (1998) https://doi.org/10.1117/12.300716
Event: Third International Conference on Thin Film Physics and Applications, 1997, Shanghai, China

Abstract

Manufacture of AlGaAs/GaAs QDs by visible light lithography and etching is accomplished in this paper, and the size distribution is studied by smaill-spotted PL. The broadening of PL peaks which is caused by the fluctuation of quantum well is studied.

Citation Download Citation

Xingquan Liu, Mingfang Wan, Bo Zhang, Xiaoshuang Chen, Wei Lu, and Shuechu Shen "PL study of QDs manufactured by visible light lithography and wet etching", Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); https://doi.org/10.1117/12.300716

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