14 August 1997 193-nm excimer laser microstepper system
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Proceedings Volume 3183, Microlithographic Techniques in IC Fabrication; (1997) https://doi.org/10.1117/12.280529
Event: ISMA '97 International Symposium on Microelectronics and Assembly, 1997, Singapore, Singapore
Abstract
An excimer laser microstepper, intended for R and D studies of 193nm lithography, is described. System details such as the laser performance, beam transport, wafer handling and photoresist processes are outlined.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nadeem Hasan Rizvi, Julian S. Cashmore, Chris M. Solomon, Phil T. Rumsby, Malcolm C. Gower, "193-nm excimer laser microstepper system", Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); doi: 10.1117/12.280529; https://doi.org/10.1117/12.280529
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