14 August 1997 193-nm excimer laser microstepper system
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Proceedings Volume 3183, Microlithographic Techniques in IC Fabrication; (1997) https://doi.org/10.1117/12.280529
Event: ISMA '97 International Symposium on Microelectronics and Assembly, 1997, Singapore, Singapore
Abstract
An excimer laser microstepper, intended for R and D studies of 193nm lithography, is described. System details such as the laser performance, beam transport, wafer handling and photoresist processes are outlined.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nadeem Hasan Rizvi, Nadeem Hasan Rizvi, Julian S. Cashmore, Julian S. Cashmore, Chris M. Solomon, Chris M. Solomon, Phil T. Rumsby, Phil T. Rumsby, Malcolm C. Gower, Malcolm C. Gower, } "193-nm excimer laser microstepper system", Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); doi: 10.1117/12.280529; https://doi.org/10.1117/12.280529
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