Paper
11 August 1997 Infrared photodetectors based on narrow-gap AIIIBV semiconductor materials grown by LP-MOCVD
Grachik H. Avetisyan, Vladimir B. Kulikov, Vitalij P. Kotov, Igor Dmitrievich Zalevsky, Peter V. Bulaev, Anatoliy A. Padalitsa, Vladimir Alekseevic Gorbylev
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Proceedings Volume 3200, Third Conference on Photonic Systems for Ecological Monitoring; (1997) https://doi.org/10.1117/12.284739
Event: Third Conference on Photonic Systems for Ecological Monitoring, 1996, Prague, Czech Republic
Abstract
Low Pressure Metalorganic Chemical Vapor Deposition (LP MOCVD) epitaxial growth of InAs0.85Sb0.15 p-i-n structures for infrared photodetectors arrays is reported. Monocrystalline epitaxial layers of InAsSb were grown on semi-insulating GaAs wafers. Method of variable composition superlattice buffer layer epitaxial growth to overcome difficulties of large lattice mismatch (up to 14%) between InAsSb and GaAs was introduced. For the first time growth of wide-gap AlSb dielectric layer was realized. Using of AlSb layer in p-i-n structure makes possible to decrease photodetector dark current considerably. Absorption and photosensitivity spectra of grown p-i-n heterostructures were investigated. Photodetectors fabricated from such structures operate in photovoltaic mode. Photoresponsivity of test photodetectors was 1 A/W at the wavelength 4.5 mkm.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Grachik H. Avetisyan, Vladimir B. Kulikov, Vitalij P. Kotov, Igor Dmitrievich Zalevsky, Peter V. Bulaev, Anatoliy A. Padalitsa, and Vladimir Alekseevic Gorbylev "Infrared photodetectors based on narrow-gap AIIIBV semiconductor materials grown by LP-MOCVD", Proc. SPIE 3200, Third Conference on Photonic Systems for Ecological Monitoring, (11 August 1997); https://doi.org/10.1117/12.284739
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