2 January 1998 Epitaxial oxide thin films: the new frontier
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Proceedings Volume 3211, International Conference on Fiber Optics and Photonics: Selected Papers from Photonics India '96; (1998) https://doi.org/10.1117/12.345524
Event: International Conference on Fiber Optics and Photonics: Selected Papers from Photonics India '96, 1996, Madras, India
Abstract
The last decade has set the stage for the emergence of epitaxial metal-oxide films as one of the leading Optoelectronic material system of the future. This scenario was primarily stimulated by the advent of high temperature superconductors, a multi-component oxide, but more recently the resurgence of interest in doped oxide thin films has led to renewed interest in epitaxial oxide films in which a number of functionalities of importance to Optoelectronics have been seen. In this article we will make a brief sketch of the status of this technology.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
T. Venkatesan, "Epitaxial oxide thin films: the new frontier", Proc. SPIE 3211, International Conference on Fiber Optics and Photonics: Selected Papers from Photonics India '96, (2 January 1998); doi: 10.1117/12.345524; https://doi.org/10.1117/12.345524
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