5 September 1997 Development of a silicon microprobe for NO detection
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Proceedings Volume 3223, Micromachining and Microfabrication Process Technology III; (1997); doi: 10.1117/12.284501
Event: Micromachining and Microfabrication, 1997, Austin, TX, United States
Abstract
An array of electrochemical sensors -- amperometric detection -- was developed using silicon planar technology. Our main purpose is to detect the activity of free radicals such as nitric oxide (NO) at cellular dimensions. In this paper we focused on the process sequence used to produce silicon microprobes, based on plasma etching. Typical dimensions of the structures are: a length of 10 mm, a width of 1 mm, a tip width of 60 micrometers, and a thickness of 30 micrometers. Four different probe designs were adopted in order to test mechanical integrity. The defined process using plasma etching revealed to be feasible, although the lateral walls of the obtained probes resulted very rough. Preliminary mechanical tests were performed using probes with a thickness of 300 micrometers. Probes with wider shapes seem to have a better combination of higher fracture force and possibility to place more electrodes close to the tip.
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Marcelo B. A. Fontes, Jorge J. Santiago-Aviles, Rogerio Furlan, "Development of a silicon microprobe for NO detection", Proc. SPIE 3223, Micromachining and Microfabrication Process Technology III, (5 September 1997); doi: 10.1117/12.284501; https://doi.org/10.1117/12.284501
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KEYWORDS
Silicon

Plasma etching

Detector development

Electrodes

NOx

Sensors

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