5 September 1997 Microfluidic flow control using selective hydrophobic patterning
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Proceedings Volume 3224, Micromachined Devices and Components III; (1997) https://doi.org/10.1117/12.284515
Event: Micromachining and Microfabrication, 1997, Austin, TX, United States
Abstract
We have developed a method to pattern self assembled monolayer films of n-octadecyltrichlorosilane on silicon and glass substrates using a simple lift-off procedure. By defining hydrophobic regions at definite locations in microchannels and using an external pressure source, we can split off precise nanoliter volume liquid drops and control the motion of those drops through the microchannels. We have also constructed an on-chip pressure source for drop splitting and motion by heating air trapped in a micromachined chamber. Both techniques can produce and move drops on the order of 50 nl.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kalyan Handique, Bishnu P. Gogoi, David T. Burke, Carlos H. Mastrangelo, Mark A. Burns, "Microfluidic flow control using selective hydrophobic patterning", Proc. SPIE 3224, Micromachined Devices and Components III, (5 September 1997); doi: 10.1117/12.284515; https://doi.org/10.1117/12.284515
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