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12 February 1997 Detection of submicron phase defects on multiphase random logic reticles
Chris A. Spence, John L. Nistler, William H. Arnold, David Emery, Larry S. Zurbrick, Durai P. Prakash, X. Chang, Steve Khanna, Brent D. Leback, Eiji Tsujimoto, Greg P. Hughes
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Proceedings Volume 3236, 17th Annual BACUS Symposium on Photomask Technology and Management; (1997) https://doi.org/10.1117/12.301195
Event: 17th Annual BACUS Photomask Technology and Management, 1997, Redwood City, CA, United States
Abstract
In this paper we present results of an algorithm that has been developed which is sensitive to phase defects of 60 degrees on i-line alternating PSMs. This algorithm consists of microcode and software which can be loaded into existing inspection hardware. The algorithm works in die-to-die inspection mode and uses both transmitted and reflected light images to maximize sensitivity. Isolated phase defects missing and misaligned shifter edges. A programmed phase defect test plate was developed to characterize defect detection sensitivity. Detection of 60 degree defects smaller than 0.75 micrometer has been demonstrated with this algorithm. Defect sensitivity characterization and actual production plate defect results are shown.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Chris A. Spence, John L. Nistler, William H. Arnold, David Emery, Larry S. Zurbrick, Durai P. Prakash, X. Chang, Steve Khanna, Brent D. Leback, Eiji Tsujimoto, and Greg P. Hughes "Detection of submicron phase defects on multiphase random logic reticles", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301195
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KEYWORDS
Inspection
Reticles
Detection and tracking algorithms
Deep ultraviolet
Photomasks
Etching
Phase shift keying
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