Defect study in fused silica using near-field scanning optical microscopy

Ming Yan; Li Wang; Wigbert J. Siekhaus; Mark R. Kozlowski; T. Jason Yang; Umar Mohideen

doi:10.1117/12.307032

20 April 1998 Defect study in fused silica using near-field scanning optical microscopy

Ming Yan, Li Wang, Wigbert J. Siekhaus, Mark R. Kozlowski, T. Jason Yang, Umar Mohideen

Proceedings Volume 3244, Laser-Induced Damage in Optical Materials: 1997; (1998) https://doi.org/10.1117/12.307032
Event: Laser-Induced Damage in Optical Materials: 1997, 1997, Boulder, CO, United States

Abstract

Surface defects in fused silica have been characterized using Near Field Scanning Optical Microscopy (NSOM). Using total internal reflection of a p- or s-polarized laser beam, optical scattering from defects located on the surface itself as well as in the subsurface layer of polished fused silica has been measured by NSOM. The local scattering intensity has been compared with simultaneously measured surface topography. In addition, surface defects intentionally created on a fused silica surface by nano-indentation have been used to establish a correlation between optical scattering of s- and p-polarized light, surface morphology and the well known subsurface stress-field associated with nano-indentation.

Citation Download Citation

Ming Yan, Li Wang, Wigbert J. Siekhaus, Mark R. Kozlowski, T. Jason Yang, and Umar Mohideen "Defect study in fused silica using near-field scanning optical microscopy", Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); https://doi.org/10.1117/12.307032

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