20 April 1998 High-damage-threshold fluoride UV mirrors made by ion-beam sputtering
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The demonstration of the technical feasibility of very high damage threshold mirrors deposited by an ion beam sputtering process is made. The two chosen materials are Yttrium fluoride for the high index and Lithium fluoride for the low index. The threshold of these two materials at 355nm 3ns is higher than 20J/cm2. High reflection stacks have been deposited with a reflection level of 98.5 percent and a threshold which meets the laser megajoule requirements.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jean DiJon, Jean DiJon, Etienne Quesnel, Etienne Quesnel, Bernard Rolland, Bernard Rolland, Pierre Garrec, Pierre Garrec, Catherine Pelle, Catherine Pelle, Jean Hue, Jean Hue, } "High-damage-threshold fluoride UV mirrors made by ion-beam sputtering", Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); doi: 10.1117/12.306989; https://doi.org/10.1117/12.306989

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