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20 April 1998 One step closer to the intrinsic laser damage threshold of HfO2 and SiO2 monolayer thin films
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Abstract
Results from monolayer-film laser-damage studies by various authors have remained difficult to compare, owing to many extrinsic factors having impact on measured damage thresholds and observed damage morphology. Prominent among these factors are the deposition method and conditions during deposition, the choice of starting materials, and the condition of supporting substrates. Here special attention is paid to the film-supporting surface with the goal of eliminating interfacial absorption effects. Fused-silica and float-glass substrates are prepared by various techniques: cleaved, conventionally polished, conventionally polished with added magnetorheological finish, and ion milled after conventional polish. Atomic-force microscopy is employed in determining microroughness and mapping laser-damage morphology features after irradiation at 1054 nm and 351 nm. HfO2 and SiO2 monolayers deposited on these surfaces showed large variations in damage threshold and morphology, depending on substrate-finish conditions. In spite of highest microroughness, cleaved-float-glass surfaces yielded the highest damage thresholds in both bare and coated forms. A comparison between HfO2 and SiO2 monolayer damage thresholds proved SiO2 to be generally far superior to HfO2.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Semyon Papernov, D. Zaksas, J. F. Anzellotti, Douglas J. Smith, Ansgar W. Schmid, David R. Collier, and Frank A. Carbone "One step closer to the intrinsic laser damage threshold of HfO2 and SiO2 monolayer thin films", Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); doi: 10.1117/12.307018; https://doi.org/10.1117/12.307018
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