20 April 1998 Thin film contamination effects on laser-induced damage of fused silica surfaces at 355 nm
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Abstract
A set of fused silica windows were artificially contaminated by sputtering various thin film materials onto the surface to simulate target chamber contamination of high fluence optical components. The samples were then tested 1/1 and N/1 at 355 nm in air and vacuum with a 3- ns Nd:YAG laser to measure the damage threshold as a function of film thickness and film composition. The damage morphologies were characterized by Nomarski optical microscopy and SEM. The results show that thin film contamination leads to a decrease in damage threshold. The test also show a difference in damage behavior between air and vacuum. The results were compared to a model of the absorption of laser light in the film, shockwave generation and reflection, and heating dependence on film composition and thickness.
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Anne Fornier, C. Cordillot, D. Schirman, Francois Y. Genin, Alan K. Burnham, Pamela K. Whitman, Michael D. Feit, Alexander M. Rubenchik, J. M. Yoshiyama, "Thin film contamination effects on laser-induced damage of fused silica surfaces at 355 nm", Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); doi: 10.1117/12.307038; https://doi.org/10.1117/12.307038
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KEYWORDS
Contamination

Thin films

Silica

Laser induced damage

Laser damage threshold

Nd:YAG lasers

Optical components

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