12 May 1998 Fluoride thin films for reflective coatings at 157 nm
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Abstract
An overview of the excimer laser market shows the trend towards shorter operating wavelengths. The optical properties of vacuum ultraviolet materials are described and the design of a reflective fluoride multilayer coating for 157 nm is given. Practical considerations and techniques used for the coating manufacture are discussed. Results on coating performance and film properties are presented. Finally, a summary reviews the relevant aspects and salient points encountered during the project with an indication of the direction of any subsequent follow-up work.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ronald L. J. Cowell, "Fluoride thin films for reflective coatings at 157 nm", Proc. SPIE 3268, Gas and Chemical Lasers and Intense Beam Applications, (12 May 1998); doi: 10.1117/12.308091; https://doi.org/10.1117/12.308091
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KEYWORDS
Thin film coatings

Reflectivity

Manufacturing

Optical coatings

Vacuum ultraviolet

Absorption

Crystals

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