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3 June 1998 Processing ceramics by laser radiation
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Abstract
Microprocessing and film deposition with laser radiation of short wavelength and pulse length are investigated to present their process capabilities for the manufacturing of surface structures and layers within precision ceramic (BaTiO3, Si3N4, SiC) components. The microprocessing with fundamental (1(omega) ) and higher harmonic (2(omega) , 3(omega) ) Nd:YAG laser radiation (ns- and ps-pulses) is performed yielding structural dimensions below 20 micrometers during drilling and caving with the results related to the removal threshold fluence and the removal rate per pulse. The film deposition with excimer laser radiation ((lambda) L equals 248 nm, (tau) L equals 20 ns) achieves monolayer thin films of different properties according to the laser parameters and processing variables with the results related to deposit multilayer film systems. The properties of the structures and of the films are analyzed by profilometry, optical and electrical microscopy, as well as X-ray photoelectron spectroscopy. Examples are highlighted for various ceramics and discussed in view of applications of the structures and films generated.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ernst-Wolfgang Kreutz, Juergen Jandeleit, Ruth Weichenhain, Manfred Sommer, Alexander Horn, and A. Curdt "Processing ceramics by laser radiation", Proc. SPIE 3274, Laser Applications in Microelectronic and Optoelectronic Manufacturing III, (3 June 1998); doi: 10.1117/12.309492; https://doi.org/10.1117/12.309492
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